关键词: 光刻机技术, 政策驱动, 多元耦合网络, 涌现机理

Abstract: To address the technical challenges in photolithography and achieve autonomous and manageable progress, it is imperative to stimulate the formation of a multi-coupling network in industrial technology through policy interventions. The preliminary construction of China’s photolithography technology multi-coupling theoretical model is enhanced by incorporating the relevant policy texts to delineate the policy-driven mechanisms. Additionally, the utilization of complex network knowledge flow model and the network coupling theory, along with the analysis of relevant patent data, facilitates the establishment of a multi-coupling network emergence model. This model enables the simulation and analysis of various policy-driven modes in the emergence process of China’s photolithography technology multi-coupling network, thereby facilitating a comprehensive understanding of the underlying mechanisms. The results show that in the innovation coupling period of policy development, the core lithography technology research and development entities are closely coupled with core enterprises in a hybrid drive mode, resulting in strong relationships and dense network characteristics with a high coupling degree and high knowledge transfer efficiency. Supporting technology suppliers emerge in a cluster-driven mode with close cooperation network relationships, and their cooperation strength has more synergistic advantages compared to the core technology coupling domain and the business oriented coupling domain. The hybrid driving mode is more conducive to improving network coupling compared to the leader-driven mode, in which the main innovation subsidy and the network coupling have an inverted “U”-shaped relationship. Moreover, under high innovation subsidy and low collaboration incentives, the overall coupling degree of the network decreases significantly. The mechanism summarized is of great significance for optimizing the top-level design of China’s lithography technology breakthrough, and thereby enhancing China’s ability to independently control key core technologies.

Key words: lithography machine, policy-driven, multi-coupling network, emergence mechanisms